The Producer® is a dual-wafer system that utilizes the advantages of single-wafer systems. The twin chambers process 2 wafers side-by-side utilizing separate process control parameters. The Producer system can support up to 3 twin chambers allowing 6 wafers to be processes at the same time.
The Producer system is available in 200mm (can be converted to run 300mm wafers) and 300mm only systems
The 200mm Producer system is available in two configurations: 1) Producer (Standard) and 2) Producer S (Smaller footprint)
The following chamber types can be added to the system:
PECVD TEOS - Plasma Enhanced Chemical Vapor Deposition TEOS process chamber.
PECVD Silane - Plasma Enhanced Chemical Vapor Deposition Silane process chamber.
SACVD - Sub-Atmospheric Chamical Vapor Deposition.
Black Diamond - Used to deposit a low k silicon oxide based CVD film.
